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J-GLOBAL ID:200902153112585934   Reference number:01A0426352

Improvement of Si/SiO2 Mask etching selectivity in the new D-RIE process.

新D-RIEプロセスにおけるSi/SiO2マスクエッチング選択性の改善
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Volume: 14th  Page: 76-79  Publication year: 2001 
JST Material Number: W0377A  ISSN: 1084-6999  Document type: Proceedings
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices 
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