Evaluation of Surface Silicide Growth and Substrate Metal Interfaces with Field Ion Microscopy.

TANAKA HIROAKI; OKUNO KIMIO

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J-GLOBAL ID：200902155354033963 Reference number：99A0512525

Evaluation of Surface Silicide Growth and Substrate Metal Interfaces with Field Ion Microscopy.

表面シリサイド形成層と下地金属界面の電界イオン顕微鏡による評価

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Volume： 42 Issue： 3 Page： 422 Publication year： Mar. 20, 1999
JST Material Number： G0194A ISSN： 0559-8516 CODEN： SHINA Document type： Article
Article type：短報 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Thin films of other inorganic compounds , Diffusion in solids in general

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