Art
J-GLOBAL ID：200902156737658610   Reference number：98A0954861

New-type microwave plasma source excited by azimuthally symmetric surface waves with magnetic multicusp fields.

マルチカプス磁場を用いた方位対称表面波で励起した新しいマイクロ波プラズマ源
Author (2)：
TUDA M

About TUDA M

(Mitsubishi Electric Corp., Hyogo, JPN)

About Mitsubishi Electric Corp., Hyogo, JPN

, 
ONO K

About ONO K

(Mitsubishi Electric Corp., Hyogo, JPN)

About Mitsubishi Electric Corp., Hyogo, JPN


Material：
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films  (Journal of Vacuum Science and Technology. A. Vacuum, Surfaces, and Films)

About Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films


Volume： 16  Issue： 5  Page： 2832-2839  Publication year： Sep. 1998 
JST Material Number： C0789B  ISSN： 0734-2101  CODEN： JVTAD6  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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*plasma source

About plasma source

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*plasma treatment

About plasma treatment

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Plasma devices 
(BJ02082I)

About Plasma devices

,  Techniques and equipment of thin film deposition 
(BK14020I)

About Techniques and equipment of thin film deposition

Terms in the title (6)：
Terms in the title
Keywords automatically extracted from the title.
磁場

About 磁場

, 
方位

About 方位

, 
対称

About 対称

, 
表面波

About 表面波

, 
励起

About 励起

, 
マイクロ波プラズマ

About マイクロ波プラズマ


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