Defect and electronic structures in TiSi<sub>2</sub> thin films produced by co-sputtering. Part 1: Defect analysis by transmission electron microscopy.

INUI H; HASHIMOTO T; TANAKA K; TANAKA I; MIZOGUCHI T; ADACHI H; YAMAGUCHI M

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J-GLOBAL ID：200902156981136928 Reference number：01A0283997

Defect and electronic structures in TiSi₂ thin films produced by co-sputtering. Part 1: Defect analysis by transmission electron microscopy.

共スパッタリングにより作製したTiSi₂薄膜中の欠陥および電子構造 I 透過型電子顕微鏡による欠陥の解析

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Author (7)： , , , , , ,
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Volume： 49 Issue： 1 Page： 83-92 Publication year： Jan. 08, 2001
JST Material Number： A0316A ISSN： 1359-6454 Document type： Article
Article type：原著論文 Country of issue： United Kingdom (GBR) Language： ENGLISH (EN)

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Thin films of other inorganic compounds , Structure of other amorphous materials

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Defect and electronic structures in TiSi2 thin films produced by co-sputtering. Part 1: Defect analysis by transmission electron microscopy.

Defect and electronic structures in TiSi₂ thin films produced by co-sputtering. Part 1: Defect analysis by transmission electron microscopy.