Art
J-GLOBAL ID:200902159127081094
Reference number:96A0268950
Application of hydrogen ion beams to Silicon On Insulator material technology.
シリコンオンインシュレータ材料技術への水素イオンビームの応用
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Author (1):
Material:
Volume:
108
Issue:
3
Page:
313-319
Publication year:
Feb. 1996
JST Material Number:
H0899A
ISSN:
0168-583X
Document type:
Article
Article type:
原著論文
Country of issue:
Netherlands (NLD)
Language:
ENGLISH (EN)
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JST classification (1):
JST classification
Category name(code) classified by JST.
Applications of electron beams and ion beams
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