Soft x-ray Photoemission studies of the HfO<sub>2</sub>/SiO<sub>2</sub>/Si system.

SAYAN S; GARFUNKEL E; SUZER S

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J-GLOBAL ID：200902163396799373 Reference number：02A0311127

Soft x-ray Photoemission studies of the HfO₂/SiO₂/Si system.

HfO₂/SiO₂/Siシステムの軟X線光電子放出研究

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Material：
Volume： 80 Issue： 12 Page： 2135-2137 Publication year： Mar. 25, 2002
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Metal-insulator-semiconductor structures , Electron spectroscopy

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Soft x-ray Photoemission studies of the HfO2/SiO2/Si system.

Soft x-ray Photoemission studies of the HfO₂/SiO₂/Si system.