Art
J-GLOBAL ID:200902165365689858   Reference number:99A0453435

A low-energy ion beam system for studying energetic ion deposition on Silicon surfaces.

シリコン表面上の高エネルギーイオン蒸着研究のための低エネルギーイオンビームシステム
Author (1):
Material:
Volume: 53  Issue: 3/4  Page: 459-464  Publication year: Jun. 1999 
JST Material Number: E0347A  ISSN: 0042-207X  Document type: Article
Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)

Return to Previous Page