Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable field-emission electron source and a scanning probe microscopy sensor with atomic sharpness.

RANGELOW I W; SHI F; HUDEK P; VOLLAND B; GIVARGIZOV E I; STEPANOVA A N; OBOLENSKAYA L N; MASHKOVA E S; MOLCHANOV V A

Art

J-GLOBAL ID：200902166089033249 Reference number：99A0237720

Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable field-emission electron source and a scanning probe microscopy sensor with atomic sharpness.

原子の鋭さをもつ安定な電界放出電子源及び走査型プローブ顕微鏡センサとしての超尖鋭なシリコン及びダイヤモンド被覆シリコンチップのマイクロマシニングによる作製

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Material：
Volume： 16 Issue： 6 Page： 3185-3191 Publication year： Nov. 1998
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Electron and ion sources , Microscopy determination of structures

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