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J-GLOBAL ID:200902166185513138   Reference number:02A0355800

High-Performance Polycrystalline Silicon Thin Film Transistors on Non-Alkali Glass Produced Using Continuous Wave Laser Lateral Crystallization.

連続波レーザ横方向結晶化を利用した非アルカリガラス上の高性能多結晶シリコン薄膜トランジスタ
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Volume: 41  Issue: 3B  Page: L311-L313  Publication year: Mar. 15, 2002 
JST Material Number: F0599B  ISSN: 0021-4922  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Transistors 
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