Atomic layer deposition of SiO<sub>2</sub> using catalyzed and uncatalyzed self-limiting surface reactions.

KLAUS J W; SNEH O; OTT A W; GEORGE S M

Art

J-GLOBAL ID：200902168351602929 Reference number：00A0132698

Atomic layer deposition of SiO₂ using catalyzed and uncatalyzed self-limiting surface reactions.

触媒および非触媒自己制限表面反応を使用したSiO₂の原子層堆積

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Volume： 6 Issue： 3/4 Page： 435-448 Publication year： Jun. 1999
JST Material Number： W1109A ISSN： 0218-625X Document type： Article
Country of issue： Singapore (SGP) Language： ENGLISH (EN)

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Atomic layer deposition of SiO2 using catalyzed and uncatalyzed self-limiting surface reactions.

Atomic layer deposition of SiO₂ using catalyzed and uncatalyzed self-limiting surface reactions.