Evaluation of chemically amplified resist based on adamantyl methacrylate for 193nm lithography.

TAKAHASHI M; TAKECHI S; KAIMOTO Y; HANYU I; ABE N; NOZAKI K

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J-GLOBAL ID：200902168999595987 Reference number：95A0854455

Evaluation of chemically amplified resist based on adamantyl methacrylate for 193nm lithography.

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Author (6)： , , , , ,
Material：
Volume： 2438 Page： 422-432 Publication year： 1995
JST Material Number： D0943A ISSN： 0277-786X CODEN： PSISDG Document type： Proceedings
Country of issue： United States (USA) Language： ENGLISH (EN)

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