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J-GLOBAL ID:200902171903324733   Reference number:98A0165949

Preparation and study of doped and undoped tin dioxide films by the open air chemical vapour deposition technique.

開放化学蒸着法によるドープおよびノンドープ二酸化すず膜の作製と研究
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Volume: 307  Issue: 1/2  Page: 221-227  Publication year: Oct. 10, 1997 
JST Material Number: B0899A  ISSN: 0040-6090  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Oxide thin films 
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