Art
J-GLOBAL ID：200902172747029501   Reference number：96A0481519

Imprint Lithography with 25-Nanometer Resolution.

25nm分解能をもつ転写リソグラフィー
Author (3)：
CHOU S Y

About CHOU S Y

(Univ. Minnesota, MN, USA)

About Univ. Minnesota, MN, USA

, 
KRAUSS P R

About KRAUSS P R

(Univ. Minnesota, MN, USA)

About Univ. Minnesota, MN, USA

, 
RENSTROM P J

About RENSTROM P J

(Univ. Minnesota, MN, USA)

About Univ. Minnesota, MN, USA


Material：
Science

About Science


Volume： 272  Issue： 5258  Page： 85-87  Publication year： Apr. 05, 1996 
JST Material Number： E0078A  ISSN： 0036-8075  CODEN： SCIEA  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
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photolithography

About photolithography

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
PMMA

About PMMA


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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
分解能

About 分解能

, 
転写

About 転写

, 
リソグラフィー

About リソグラフィー


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