Art
J-GLOBAL ID:200902173650132355   Reference number:97A0374782

Atomic-layer chemical-vapor-deposition of silicon-nitride.

窒化シリコンの原子層化学蒸着
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Material:
Volume: 112  Page: 198-204  Publication year: Mar. 1997 
JST Material Number: B0707B  ISSN: 0169-4332  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Semiconductor thin films 
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