Art
J-GLOBAL ID：200902173690978010   Reference number：00A0437151

Improved contact performance of GaN film using Si diffusion.

Siの拡散を使うGaN膜のコンタクト性能の改善
Author (5)：
LIN C F

About LIN C F

(National Chiao Tung Univ., Hsinchu, TWN)

About National Chiao Tung Univ., Hsinchu, TWN

, 
CHENG H C

About CHENG H C

(National Chiao Tung Univ., Hsinchu, TWN)

About National Chiao Tung Univ., Hsinchu, TWN

, 
CHI G C

About CHI G C

(National Central Univ., Chungli, TWN)

About National Central Univ., Chungli, TWN

, 
BU C J

About BU C J

(National Chiao Tung Univ., Hsinchu, TWN)

About National Chiao Tung Univ., Hsinchu, TWN

, 
FENG M S

About FENG M S

(National Chiao Tung Univ., Hsinchu, TWN)

About National Chiao Tung Univ., Hsinchu, TWN


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 76  Issue： 14  Page： 1878-1880  Publication year： Apr. 03, 2000 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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*silicon

About silicon

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Semiconductor-metal contacts 
(BM03084G)

About Semiconductor-metal contacts

,  Diffusion in solids in general 
(BL06021L)

About Diffusion in solids in general

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
Si

About Si

, 
拡散

About 拡散

, 
GaN

About GaN

, 
コンタクト

About コンタクト


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