Contamination Removal by Single-Wafer Spin Cleaning with Repetitive Use of Ozonized Water and Dilute HF.

HATTORI T; OSAKA T; OKAMOTO A; SAGA K; KUNIYASU H

Art

J-GLOBAL ID：200902176212078142 Reference number：98A0817086

Contamination Removal by Single-Wafer Spin Cleaning with Repetitive Use of Ozonized Water and Dilute HF.

オゾン化水と希薄HFを反復使用する単一ウエハスピンクリーニングによる汚染物除去

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Material：
Volume： 145 Issue： 9 Page： 3278-3284 Publication year： Sep. 1998
JST Material Number： C0285A ISSN： 1945-7111 CODEN： JESOAN Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices

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