Properties of carbon ion deposited tetrahedral amorphous carbon films as a function of ion energy.

XU S; TAY B K; TAN H S; ZHONG L; TU Y Q; SILVA S R P; MILNE W I

Art

J-GLOBAL ID：200902176477298047 Reference number：96A0503859

Properties of carbon ion deposited tetrahedral amorphous carbon films as a function of ion energy.

炭素イオン堆積した四面体非晶質炭素膜のイオンエネルギーの関数としての性質

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Material：
Volume： 79 Issue： 9 Page： 7234-7240 Publication year： May. 01, 1996
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Semiconductor thin films

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