Art
J-GLOBAL ID:200902180295291400   Reference number:94A0546725

Production of β-SiC buffer layers for CVD diamond thin films by ion implantation.

イオン注入法によるCVDダイヤモンド薄膜に対するβ-SiC緩衝層の合成
Author (2):
Material:
Volume:Issue: 4/6  Page: 500-505  Publication year: Apr. 1994 
JST Material Number: W0498A  ISSN: 0925-9635  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
Semi thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=94A0546725&from=J-GLOBAL&jstjournalNo=W0498A") }}
JST classification (1):
JST classification
Category name(code) classified by JST.
Carbon and its compounds 
Terms in the title (5):
Terms in the title
Keywords automatically extracted from the title.

Return to Previous Page