Preparation of Al-doped ZnO thin films by RF thermal plasma evaporation.

TSUJINO J; HOMMA N; SUGAWARA T; SHIMONO I; ABE Y

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J-GLOBAL ID：200902180382924010 Reference number：02A0462066

Preparation of Al-doped ZnO thin films by RF thermal plasma evaporation.

RF熱プラズマ蒸発によるAlドープZnO薄膜の成膜

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Author (5)： , , , ,
Material：
Volume： 407 Issue： 1/2 Page： 86-91 Publication year： Mar. 22, 2002
JST Material Number： B0899A ISSN： 0040-6090 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Oxide thin films

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