Deposition of hard crystalline Al<sub>2</sub>O<sub>3</sub> coatings by bipolar pulsed d.c. PACVD.

TAESCHNER C; LJUNGBERG B; ALFREDSSON V; ENDLER I; LEONHARDT A

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J-GLOBAL ID：200902181312621521 Reference number：99A0587169

Deposition of hard crystalline Al₂O₃ coatings by bipolar pulsed d.c. PACVD.

硬質結晶性Al₂O₃皮膜のバイポーラパルス化DC PACVDによる堆積

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Volume： 108/109 Issue： 1/3 Page： 257-264 Publication year： Oct. 10, 1998
JST Material Number： D0205C ISSN： 0257-8972 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Ceramic coating to metallic materials , Oxide thin films

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Deposition of hard crystalline Al2O3 coatings by bipolar pulsed d.c. PACVD.

Deposition of hard crystalline Al₂O₃ coatings by bipolar pulsed d.c. PACVD.