Art
J-GLOBAL ID：200902185485190017   Reference number：96A0166021

Low temperature iron thin film-silicon reactions.

低温の鉄薄膜-シリコン反応
Author (2)：
BALDWIN N R

About BALDWIN N R

(Univ. Alberta, Alberta, CAN)

About Univ. Alberta, Alberta, CAN

, 
IVEY D G

About IVEY D G

(Univ. Alberta, Alberta, CAN)

About Univ. Alberta, Alberta, CAN


Material：
Journal of Materials Science  (J Mater Sci)

About Journal of Materials Science


Volume： 31  Issue： 1  Page： 31-37  Publication year： Jan. 01, 1996 
JST Material Number： B0722A  ISSN： 0022-2461  CODEN： JMTSAS  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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Iron

About Iron

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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microstructure

About microstructure


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JST classification (3)：
JST classification
Category name(code) classified by JST.
Study of adsorption by physical means 
(CB12043P)

About Study of adsorption by physical means

,  Semiconductor thin films 
(BK14040E)

About Semiconductor thin films

,  Salts 
(CD01050V)

About Salts

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
低温

About 低温

, 
鉄

About 鉄

, 
薄膜

About 薄膜

, 
シリコン

About シリコン


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