Art
J-GLOBAL ID：200902186846616029
Reference number：00A0086129
Production of highly uniform electron cyclotron resonance plasmas by distribution control of the microwave electric field.
マイクロ波電場分布の制御による非常に均一な電子サイクロトロン共鳴プラズマの生成
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Author (4)：
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Material：
Volume：
17
Issue：
6
Page：
3225-3229
Publication year：
Nov. 1999
JST Material Number：
C0789B
ISSN：
0734-2101
CODEN：
JVTAD6
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Applications of plasma
, Manufacturing technology of solid-state devices
Terms in the title (3)：
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