Nanometer-scale imaging characteristics of novolak resin-based chemical amplification negative resist systems and molecular weight distribution effects of the resin matrics.

SHIRAISHI H; YOSHIMURA T; SAKAMIZU T; UENO T; OKAZAKI S

Art

J-GLOBAL ID：200902189442188898 Reference number：95A0141449

Nanometer-scale imaging characteristics of novolak resin-based chemical amplification negative resist systems and molecular weight distribution effects of the resin matrics.

ノボラック樹脂ベースの化学増幅ネガ型レジストシステムのナノメータイメージング特性及び樹脂マトリックスの分子量分布効果

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Material：
Volume： 12 Issue： 6 Page： 3895-3899 Publication year： Nov. 1994
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Applications of electron beams and ion beams

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