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J-GLOBAL ID:200902189442188898   Reference number:95A0141449

Nanometer-scale imaging characteristics of novolak resin-based chemical amplification negative resist systems and molecular weight distribution effects of the resin matrics.

ノボラック樹脂ベースの化学増幅ネガ型レジストシステムのナノメータイメージング特性及び樹脂マトリックスの分子量分布効果
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Material:
Volume: 12  Issue:Page: 3895-3899  Publication year: Nov. 1994 
JST Material Number: E0974A  ISSN: 1071-1023  CODEN: JVTBD9  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices  ,  Applications of electron beams and ion beams 

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