Art

J-GLOBAL ID：200902189738145426   Reference number：01A0157073

157nm resist materials: Progress report.

157nmレジスト材料 経過報告

Author (9)： BRODSKY C (Univ. Texas at Austin, Texas) ,  BYERS J (Univ. Texas at Austin, Texas) ,  CONLEY W (Univ. Texas at Austin, Texas) ,  HUNG R (Univ. Texas at Austin, Texas) ,  YAMADA S (Univ. Texas at Austin, Texas) ,  PATTERSON K (Univ. Texas at Austin, Texas) ,  SOMERVELL M (Univ. Texas at Austin, Texas) ,  TRINQUE B (Univ. Texas at Austin, Texas) ,  WILLSON C G (Univ. Texas at Austin, Texas)
Material： Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures  (Journal of Vacuum Science & Technology. B. Microelectronics Processing and Phenomena)
Volume： 18  Issue： 6  Page： 3396-3401  Publication year： Nov. 2000 
JST Material Number： E0974A  ISSN： 1071-1023  CODEN： JVTBD9  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： *chemically amplified resist ,...

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JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

Substance index (5)： (1S,4R)-5,5-Difluoro-6β-(trifluoromethyl)norborna-2-ene-6-carboxylic acid ethyl ester ,  (1S,4R)-5,5-Difluoro-6β-(trifluoromethyl)-6-ethoxynorborna-2-ene ,  (1S,4R)-5,5-Difluoro-6α-[2-ethoxy-2-(trifluoromethyl)-3,3,3-trifluoropropyl]norborna-2-ene ,  (1S,4R)-6β-(Trifluoromethyl)norborna-2-ene-6-carboxylic acid ethyl ester ,  (1S)-6,6-Difluoro-7β-(trifluoromethyl)-1β,4β:5β,8β-dimethano-1,4,4aα,5,6,7,8,8aα-octahydronaphthalene-7-carboxylic acid ethyl ester

Terms in the title (2)： レジスト材料 ,  報告