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J-GLOBAL ID:200902189891798560   Reference number:99A0326906

Negative Differential Resistance of CaF2/CdF2 Triple-Barrier Resonant-Tunneling Diode on Si(111) Grown by Partially Ionized Beam Epitaxy.

Si(111)上に部分イオン化ビームエピタクシーによって成長させたCaF2/CdF2三重障壁共鳴トンネルダイオードの負の微分抵抗
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Volume: 38  Issue: 2A  Page: L116-L118  Publication year: Feb. 01, 1999 
JST Material Number: F0599B  ISSN: 0021-4922  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Metal-insulator-semiconductor structures  ,  Diodes 
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