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J-GLOBAL ID:200902190486968724   Reference number:97A0823513

Materials Characterization of Plasma Deposited Copolymer Using CFC-113 With C2H4 Monomer.

C2H4モノマとCFC-113を使ってプラズマ蒸着した共重合体の材料特性
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Material:
Volume: 36  Issue: 7B  Page: 4964-4967  Publication year: Jul. 1997 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Category name(code) classified by JST.
Copolymerization  ,  Thin films of organic compounds 
Reference (10):
  • 1) O. Tsuji: U.S. Pat. 5, 569,810.
  • 2) O. Tsuji, M. Sawai, H. Nakano and K. Miyashita: 7th Symp. Plasma Materials Conf. Abstr. (1994) p. 48.
  • 3) O. Tsuji, M. Sawai, H. Nakano and T. Minaguchi: Chem. Instrum. (1995) Feb., 73.
  • 4) O. Tsuji, M. Sawai, H. Nakano, T. Minaguchi and T. Wydeven: 12th Int. Symp. Plasma Chemistry, Minneapolis, Minn., Abstr. (1995) p. 983.
  • 5) O. Tsuji, T. Minaguchi, H. Nakano and T. Tatsuta: 3rd Asia-Pacific Conf. On Plasma Sci. & Tech., Proc. (1996) p. 111.
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