Art

J-GLOBAL ID：200902194482060383   Reference number：96A1011817

New Low Temperature Processing of Sol-Gel SrBi₂Ta₂O₉ Thin Films.

ゾル-ゲル法によるSrBi₂Ta₂O₉薄膜の新低温処理法

Author (7)： ITO Y (Sharp Corp., Chiba, JPN) ,  USHIKUBO M (Sharp Corp., Chiba, JPN) ,  YOKOYAMA S (Sharp Corp., Chiba, JPN) ,  MATSUNAGA H (Sharp Corp., Chiba, JPN) ,  ATSUKI T (Mitsubishi Material Corp., Saitama, JPN) ,  YONEZAWA T (Mitsubishi Material Corp., Saitama, JPN) ,  OGI K (Mitsubishi Material Corp., Saitama, JPN)
Material： Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers  (Japanese Journal of Applied Physics. Part 1. Regular Papers, Brief Communications & Review Papers)
Volume： 35  Issue： 9B  Page： 4925-4929  Publication year： Sep. 1996 
JST Material Number： G0520B  ISSN： 0021-4922  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *ferroelectrics ,...

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JST classification (2)： Ferroelectrics,antiferroelectrics and ferroelasticity  (BM05030B) ,  Oxide thin films  (BK14050P)

Reference (17)：

• WU, S. Y. IEEE Trans. Electron Devices. 1974, ED-21, 499
• KINNEY, W. I. Tech. Dig. Int. Electron. Device Meet. 1987, 850
• EATON, S. S. IEEE ISSCC Tech. Dig. 1988, 130
• SCOTT, J. F. Science. 1989, 246, 1400
• EVANS, J. T. IEEE J. Solid-State Circ. 1988, SSC-23, 1171

Terms in the title (3)： ゾル-ゲル法 ,  薄膜 ,  低温処理