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J-GLOBAL ID：200902195558624016   Reference number：95A0910832

New Fabrication Process for Small Junctions Using a Selective Etch-Back Technique.

選択的エッチバック法による小接合の新作製法
Author (4)：
KODAIRA S

About KODAIRA S

(Kisarazu National Coll. Technol., Chiba, JPN)

About Kisarazu National Coll. Technol., Chiba, JPN

, 
SHOJI A

About SHOJI A

(Electrotechnical Lab., Ibaraki, JPN)

About Electrotechnical Lab., Ibaraki, JPN

, 
KOHJIRO S

About KOHJIRO S

(Electrotechnical Lab., Ibaraki, JPN)

About Electrotechnical Lab., Ibaraki, JPN

, 
KIRYU S

About KIRYU S

(Electrotechnical Lab., Ibaraki, JPN)

About Electrotechnical Lab., Ibaraki, JPN


Material：
Japanese Journal of Applied Physics. Part 2. Letters  (Japanese Journal of Applied Physics. Part 2. Letters & Express Letters)

About Japanese Journal of Applied Physics. Part 2. Letters


Volume： 34  Issue： 9A  Page： L1127-L1129  Publication year： Sep. 01, 1995 
JST Material Number： F0599B  ISSN： 0021-4922  Document type： Article
Article type： 短報  Country of issue： Japan (JPN)  Language： ENGLISH (EN)
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silicon dioxide

About silicon dioxide

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
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All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
melt-back

About melt-back


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JST classification (1)：
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Josephson junction and elements 
(BM04043E)

About Josephson junction and elements

Reference (6)：
ｍore...
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エッチバック

About エッチバック

, 
作製法

About 作製法


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