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J-GLOBAL ID:200902196815289513   Reference number:01A0976291

Nanoscale patterning of Si(100) surfaces by scratching through the native oxide layer using atomic force microscope.

原子間力顕微鏡を用いた自然の酸化物層の引っかきによるSi(100)表面のナノスケールのパターンづけ
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Volume: 79  Issue: 12  Page: 1882-1884  Publication year: Sep. 17, 2001 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices 
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