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J-GLOBAL ID:200902197341623014   Reference number:95A0654828

Atomic force microscope lithography using amorphous silicon as a resist and advances in parallel operation.

レジストとして非晶質シリコンを用いた原子間力顕微鏡リソグラフィーおよび平行操作における進歩
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Volume: 13  Issue:Page: 1380-1385  Publication year: May. 1995 
JST Material Number: E0974A  ISSN: 1071-1023  CODEN: JVTBD9  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Electron and ion microscopes  ,  Manufacturing technology of solid-state devices 
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