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J-GLOBAL ID:200902198377714950   Reference number:02A0920337

Influence of 4H-SiC Growth Conditions on Micropipe Dissociation.

ミクロパイプ解離の4H-SiC成長条件が及ぼす影響
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Volume: 41  Issue: 10B  Page: L1137-L1139  Publication year: Oct. 15, 2002 
JST Material Number: F0599B  ISSN: 0021-4922  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Lattice defects in semiconductors  ,  Semiconductor thin films 
Reference (7):
  • 1) P. G. Neudeck and J. A. Powell: IEEE Electron Device Lett. 15 (1994) 63.
  • 2) I. Kamata, H. Tsuchida, T. Jikimoto and K. Izumi: Jpn. J. Appl. Phys. 40 (2001) L1012.
  • 3) H. Tsuchida, T. Tsuji, I. Kamata, T. Jikimoto, H. Fujisawa, S. Ogino and K. Izumi: Mater. Sci. Forum 353-356 (2001) 131.
  • 4) R. Yakimova, M. Tuominen, A. S. Bakin, J.-O. Fornell, A. Vehanen and E. Janzen: Inst. Phys. Conf. Ser. 142 (1996) 101.
  • 5) S. Rendakova, N. Kuznetsov, N. Savkina, M. Rastegaeva, A. Andreev, M. Minbaeva, A. Morozov and V. Dmitriev: Mater. Res. Soc. Symp. Proc. 512 (1998) 131.
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