Art
J-GLOBAL ID：200902199875416564
Reference number：00A0906765
Film growth precursors in a remote SiH4 plasma used for high-rate deposition of hydrogenated amorphous silicon.
水素化非晶質シリコンの高速蒸着に用いる遠隔SiH4プラズマ中の膜成長前駆体
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Author (3)：
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Material：
Volume：
18
Issue：
5
Page：
2153-2163
Publication year：
Sep. 2000
JST Material Number：
C0789B
ISSN：
0734-2101
CODEN：
JVTAD6
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films
, Reaction due to charged particle bombardment and electric discharge
Terms in the title (7)：
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