Fabrication of 200nm period nanomagnet arrays using interference lithography and a negative resist.

FARHOUD M; FERRERA J; LOCHTEFELD A J; MURPHY T E; SCHATTENBURG M L; CARTER J; ROSS C A; SMITH H I

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J-GLOBAL ID：200902199990450490 Reference number：00A0122755

Fabrication of 200nm period nanomagnet arrays using interference lithography and a negative resist.

干渉リソグラフィーとネガ型レジストを用いた200nm周期のナノマグネットアレイの作製

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Material：
Volume： 17 Issue： 6 Page： 3182-3185 Publication year： Nov. 1999
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Electronic recording,magnetic recording,optical recording

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