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J-GLOBAL ID：200902200893978071   Reference number：07A1008052

Fine Channel Mist CVD法による単結晶ZnO薄膜の作製(2)

Author (3)：
KAWAHARAMURA TOSHIYUKI

About KAWAHARAMURA TOSHIYUKI

(京大 大学院)

About 京大 大学院

, 
NISHINAKA HIROYUKI

About NISHINAKA HIROYUKI

(京大 大学院)

About 京大 大学院

, 
FUJITA SHIZUO

About FUJITA SHIZUO

(京大 国際融合創造セ)

About 京大 国際融合創造セ


Material：
応用物理学会学術講演会講演予稿集  (Extended Abstracts. Annual Meeting. Japan Society of Applied Physics)

About 応用物理学会学術講演会講演予稿集


Volume： 68th  Issue： 1  Page： 565  Publication year： Sep. 04, 2007 
JST Material Number： Y0055A  Document type： Proceedings
Article type： 短報  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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*single crystal

About single crystal

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Techniques and equipment of thin film deposition 
(BK14020I)

About Techniques and equipment of thin film deposition

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
MISt

About MISt

, 
CVD法

About CVD法

, 
単結晶

About 単結晶

, 
ZnO薄膜

About ZnO薄膜

, 
作製

About 作製


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