Art
J-GLOBAL ID:200902201753390062   Reference number:03A0506384

Line-Edge Roughness: Characterization and Material Origin

ライン-エッジ粗さ:特性評価と材料の原因
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Material:
Volume: 42  Issue: 6B  Page: 3755-3762  Publication year: Jun. 30, 2003 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices 
Reference (37):
  • 1) T. Yoshimura, H. Shiraishi, J. Yamamoto and S. Okazaki: Appl. Phys. Lett. 63 (1993) 764.
  • 2) M. Nagase, H. Namatsu, K. Kurihara, K. Iwadate, K. Murase and T. Makino: Microelectron. Eng. 30 (1996) 419.
  • 3) G. W. Reynolds and J. W. Taylor: J. Vac. Sci. Technol. B17 (1999) 2823.
  • 4) C. Nelson, S. C. Palmateer, A. R. Forte and T. Lyszczarz: J. Vac. Sci. Technol. B17 (1999) 2488.
  • 5) N. Rau, F. Stratton, C. Fields, T. Ogawa, A. Neureuther, R. Kubena and C. G. Willson: J. Vac. Sci. Technol. B16 (1998) 3784.
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