Tantalum film for x-ray lithography mask deposited by electron cyclotron resonance plasma source coupled with divided microwaves

NISHIMURA H; ONO T; ODA M; MATSUO S

Art

J-GLOBAL ID：200902203327562380 Reference number：04A0196479

Tantalum film for x-ray lithography mask deposited by electron cyclotron resonance plasma source coupled with divided microwaves

分割型マイクロ波と結合した電子サイクロトロン共鳴プラズマ源によって蒸着したX線リソグラフィーマスク用タンタル膜

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Material：
Volume： 22 Issue： 1 Page： 40-45 Publication year： Jan. 2004
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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X-ray instruments and techniques , Metallic thin films , Manufacturing technology of solid-state devices

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