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J-GLOBAL ID:200902206476170159   Reference number:04A0418757

Localized deposition of hydrocarbon using plasma activated chemical vapour deposition

プラズマ活性化化学蒸着を用いた炭化水素の局所的堆積
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Material:
Volume: 457  Issue:Page: 241-245  Publication year: Jun. 15, 2004 
JST Material Number: B0899A  ISSN: 0040-6090  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Thin films of organic compounds  ,  Techniques and equipment of thin film deposition 
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