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J-GLOBAL ID：200902210688581415   Reference number：05A0243099

FABRICATION OF CeO2 FILMS ON SILICON SUBSTRATES BY CHEMICAL VAPOR DEPOSITION

CVD法によるシリコン基板上のCeO2フィルムの作成
Author (7)：
SAKURAI K

About SAKURAI K

(Hosei Univ., Tokyo)

About Hosei Univ., Tokyo

, 
OHNO H

About OHNO H

(Hosei Univ., Tokyo)

About Hosei Univ., Tokyo

, 
TAGUI K

About TAGUI K

(Hosei Univ., Tokyo)

About Hosei Univ., Tokyo

, 
MORITA T

About MORITA T

(Hosei Univ., Tokyo)

About Hosei Univ., Tokyo

, 
SUZUKI S

About SUZUKI S

(Semiconductor Process Lab. Co., Ltd, Chiba)

About Semiconductor Process Lab. Co., Ltd, Chiba

, 
ISHIBASHI K

About ISHIBASHI K

(ANELVA CORP., Tokyo)

About ANELVA CORP., Tokyo

, 
YAMAMOTO Y

About YAMAMOTO Y

(Hosei Univ., Tokyo)

About Hosei Univ., Tokyo


Material：
Report of Research Center of Ion Beam Technology, Hosei University. Supplement  (法政大学イオンビーム工学研究所報告 別冊)

About Report of Research Center of Ion Beam Technology, Hosei University. Supplement


Issue： 23  Page： 27-30  Publication year： Mar. 2005 
JST Material Number： L0263A  ISSN： 0914-2908  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)
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MOCVD

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,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
carrier

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JST classification (1)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

Substance index (1)：
Substance index
Chemical Substance indexed to the Article.
Tetrakis(1,1-diethylethoxy) cerium(IV)

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Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
CVD法

About CVD法

, 
シリコン基板

About シリコン基板

, 
CeO2

About CeO2

, 
フィルム

About フィルム


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