Art
J-GLOBAL ID：200902210705897162   Reference number：07A0731194

Printing of structures less than 0.3um by i-line exposure using resists TDMR-AR80 und TDMR-AR95

レジストTDMR-AR80およびTDMR-AR95を用いたi線露光による0.3μm以下の構造のプリンティング
Author (3)：
BEHRENDT A.

About BEHRENDT A.

(Infineon Technol. Austria AG, Villach)

About Infineon Technol. Austria AG, Villach

, 
DOW T.

About DOW T.

(Infineon Technol. Austria AG, Villach)

About Infineon Technol. Austria AG, Villach

, 
STOEFLIN K.

About STOEFLIN K.

(Infineon Technol. Austria AG, Villach)

About Infineon Technol. Austria AG, Villach


Material：
Proceedings of SPIE  (Proceedings. SPIE - The International Society for Optical Engineering)

About Proceedings of SPIE


Volume： 6519  Issue： Pt.2  Page： 65193J.1-65193J.8  Publication year： 2007 
JST Material Number： D0943A  ISSN： 0277-786X  CODEN： PSISDG  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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*photoresist

About photoresist

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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i線

About i線

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
レジスト

About レジスト

, 
露光

About 露光

, 
プリンティング

About プリンティング


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