Art
J-GLOBAL ID：200902213270712920   Reference number：07A0498780

Damage-free cryogenic aerosol clean processes

ダメージフリー低温エアロゾルクリーンプロセス
Author (5)：
LIN Hong

About LIN Hong

(IBM Systems and Technology Group, NY, USA)

About IBM Systems and Technology Group, NY, USA

, 
CHIOUJONES Kelly

About CHIOUJONES Kelly

(IBM Systems and Technology Group, NY, USA)

About IBM Systems and Technology Group, NY, USA

, 
LAUERHAAS Jeff

About LAUERHAAS Jeff

(FSI International, MN, USA)

About FSI International, MN, USA

, 
FREEBERN Tim

About FREEBERN Tim

(IBM Systems and Technology Group, NY, USA)

About IBM Systems and Technology Group, NY, USA

, 
YU Chienfan

About YU Chienfan

(IBM Systems and Technology Group, NY, USA)

About IBM Systems and Technology Group, NY, USA


Material：
IEEE Transactions on Semiconductor Manufacturing  (IEEE Trans Semicond Manuf)

About IEEE Transactions on Semiconductor Manufacturing


Volume： 20  Issue： 2  Page： 101-106  Publication year： May. 2007 
JST Material Number： T0521A  ISSN： 0894-6507  CODEN： ITSMED  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
aspect ratio

About aspect ratio

,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=07A0498780&from=J-GLOBAL&jstjournalNo=T0521A") }}
JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (2)：
Terms in the title
Keywords automatically extracted from the title.
ダメージ

About ダメージ

, 
低温

About 低温


Return to Previous Page

TOP

BOTTOM