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J-GLOBAL ID：200902215710515296   Reference number：05A0365451

Formation and reactivity of high quality halogen terminated Si(1 1 1) surfaces

高品質ハロゲン終端Si(111)表面の形成と反応性
Author (2)：
EVES B.J.

About EVES B.J.

(National Res. Council, Ont., CAN)

About National Res. Council, Ont., CAN

, 
LOPINSKI G.P.

About LOPINSKI G.P.

(National Res. Council, Ont., CAN)

About National Res. Council, Ont., CAN


Material：
Surface Science  (Surface Science Letters)

About Surface Science


Volume： 579  Issue： 2/3  Page： L89-L96  Publication year： Apr. 01, 2005 
JST Material Number： C0129B  ISSN： 0039-6028  Document type： Article
Article type： 短報  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
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*silicon

About silicon

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
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hydroxyl group

About hydroxyl group

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Surface structure of semiconductors 
(BK15030A)

About Surface structure of semiconductors

,  Study of adsorption by physical means 
(CB12043P)

About Study of adsorption by physical means

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
高品質

About 高品質

, 
ハロゲン

About ハロゲン

, 
終端

About 終端

, 
Si

About Si

, 
反応性

About 反応性


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