Area selective formation of magnetic nanodot arrays on Si wafer by electroless deposition

KAWAJI J; KITAIZUMI F; OIKAWA H; NIWA D; HOMMA T; OSAKA T

Art

J-GLOBAL ID：200902220406354913 Reference number：05A0182974

Area selective formation of magnetic nanodot arrays on Si wafer by electroless deposition

Siウエハへの析出による磁気ドットアレーの位置選択的形成

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Author (6)： , , , , ,
Material：
Volume： 287 Page： 245-249 Publication year： Feb. 2005
JST Material Number： H0644A ISSN： 0304-8853 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Electroless plating , Electronic recording,magnetic recording,optical recording

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