Effects of Substrate Temperature and O<sub>2</sub> Gas Partial Pressure on Mechanical Properties of Alumina Films deposited by Radio Frequency Magnetron Sputtering

FUJIYAMA HIROKAZU; SUMOMOGI TSUNETAKA; UCHIJO KENJI

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J-GLOBAL ID：200902221666992120 Reference number：03A0830707

Effects of Substrate Temperature and O₂ Gas Partial Pressure on Mechanical Properties of Alumina Films deposited by Radio Frequency Magnetron Sputtering

高周波マグネトロンスパッタ法によるアルミナ膜の組成と機械的特性に及ぼす基板温度と酸素分圧の影響

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Volume： 20 Page： 17-26 Publication year： Oct. 31, 2003
JST Material Number： Y0948A ISSN： 0911-050X Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Oxide thin films , Mechanical properties of solids in general

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Effects of Substrate Temperature and O2 Gas Partial Pressure on Mechanical Properties of Alumina Films deposited by Radio Frequency Magnetron Sputtering

Effects of Substrate Temperature and O₂ Gas Partial Pressure on Mechanical Properties of Alumina Films deposited by Radio Frequency Magnetron Sputtering