Art

J-GLOBAL ID：200902228090816228   Reference number：06A0602578

Numerical analyses of a microwave plasma chemical vapor deposition reactor for thick diamond syntheses

厚いダイヤモンド合成向けマイクロ波プラズマ化学蒸着装置の数値解析

Author (5)： YAMADA H. (Diamond Res. Center, National Inst. of Advanced Industrial Sci. and Technol. (AIST), 1-8-31 Midorigaoka, Ikeda ...) ,  CHAYAHARA A. (Diamond Res. Center, National Inst. of Advanced Industrial Sci. and Technol. (AIST), 1-8-31 Midorigaoka, Ikeda ...) ,  MOKUNO Y. (Diamond Res. Center, National Inst. of Advanced Industrial Sci. and Technol. (AIST), 1-8-31 Midorigaoka, Ikeda ...) ,  HORINO Y. (Diamond Res. Center, National Inst. of Advanced Industrial Sci. and Technol. (AIST), 1-8-31 Midorigaoka, Ikeda ...) ,  SHIKATA S. (Diamond Res. Center, National Inst. of Advanced Industrial Sci. and Technol. (AIST), 1-8-31 Midorigaoka, Ikeda ...)
Material： Diamond and Related Materials  (Diam Relat Mater)
Volume： 15  Issue： 9  Page： 1389-1394  Publication year： Sep. 2006 
JST Material Number： W0498A  ISSN： 0925-9635  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *Diamond ,...
Semi thesaurus term： power density

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JST classification (1)： Techniques and equipment of thin film deposition  (BK14020I)

Terms in the title (3)： ダイヤモンド ,  マイクロ波プラズマ化学蒸着 ,  数値解析