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J-GLOBAL ID:200902235304520468   Reference number:05A0060741

Control on the formation of Si nanodots fabricated by thermal annealing/oxidation of hydrogenated amorphous silicon

水素化非晶質シリコンの熱アニール/酸化により作製したSiナノドットの形成制御
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Volume: 96  Issue: 12  Page: 7532-7536  Publication year: Dec. 15, 2004 
JST Material Number: C0266A  ISSN: 0021-8979  CODEN: JAPIAU  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Semiconductor thin films 

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