Art

J-GLOBAL ID：200902237814720391   Reference number：09A0087164

Characterization of BCN films synthesized by radiofrequency plasma enhanced chemical vapor deposition

高周波プラズマCVDで合成したBCN膜の評価

Author (5)： ABDUL MANNAN Md. (Dep. of Chemistry and Applied Chemistry, Fac. of Sci. and Engineering, Saga Univ., 1 Honjo, Saga 840-8502, JPN) ,  NAGANO Masamitsu (Dep. of Chemistry and Applied Chemistry, Fac. of Sci. and Engineering, Saga Univ., 1 Honjo, Saga 840-8502, JPN) ,  KIDA Tetsuya (Dep. of Chemistry and Applied Chemistry, Fac. of Sci. and Engineering, Saga Univ., 1 Honjo, Saga 840-8502, JPN) ,  HIRAO Norie (Synchrotron Radiation Res. Unit, Quantum Beam Sci. Directorate, Japan Atomic Energy Agency, Tokai-mura, Ibaraki ...) ,  BABA Yuji (Synchrotron Radiation Res. Unit, Quantum Beam Sci. Directorate, Japan Atomic Energy Agency, Tokai-mura, Ibaraki ...)
Material： Journal of Physics and Chemistry of Solids  (J Phys Chem Solids)
Volume： 70  Issue： 1  Page： 20-25  Publication year： Jan. 2009 
JST Material Number： C0202A  ISSN： 0022-3697  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Thesaurus term： *plasma CVD ,  wafer ,  FTIR spectroscopy ,  infrared absorption spectrum ,  XANES ,  *X-ray photoelectron spectrum ,  semiconductor thin film ,  ceramic membrane ,  configuration mixing ,  carbide ,  nitride ,  *boron compound ,  radiofrequency discharge ,  compound semiconductor ,  polarization dependence ,  Si wafer ,  *NEXAFS
Semi thesaurus term： Si substrate ,  *near edge X ray absorption fine structure

JST classification (3)： Semiconductor thin films  (BK14040E) ,  X-ray spectra in general.Including X-ray  (BM08101P) ,  Electron spectroscopy  (BM09060K)

Substance index (1)： Tris(dimethylamino)borane

Terms in the title (3)： 高周波 ,  プラズマCVD ,  評価