Art

J-GLOBAL ID：200902240213870168   Reference number：09A1106321

Fabrication of DLC films by pulsed ion beam ablation in a dense plasma focus device

高密度プラズマ集束装置におけるパルスイオンビームアブレーションによるDLC幕の作製

Author (5)： WANG Z.p. (Dep. of Electric and Electronic System Engineering, Univ. of Toyama, 3190 Gofuku, Toyama 930-8555, JPN) ,  YOUSEFI H.r. (Dep. of Electric and Electronic System Engineering, Univ. of Toyama, 3190 Gofuku, Toyama 930-8555, JPN) ,  NISHINO Y. (Dep. of Electric and Electronic System Engineering, Univ. of Toyama, 3190 Gofuku, Toyama 930-8555, JPN) ,  ITO H. (Dep. of Electric and Electronic System Engineering, Univ. of Toyama, 3190 Gofuku, Toyama 930-8555, JPN) ,  MASUGATA K. (Dep. of Electric and Electronic System Engineering, Univ. of Toyama, 3190 Gofuku, Toyama 930-8555, JPN)
Material： Physics Letters. A  (Phys Lett A)
Volume： 373  Issue： 45  Page： 4169-4173  Publication year： Nov. 02, 2009 
JST Material Number： C0600B  ISSN： 0375-9601  Document type： Article
Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Terms in the title (5)： 高密度プラズマ ,  集束 ,  DLC ,  幕 ,  作製