Low Temperature (<100°C) Deposition of Aluminum Oxide Thin Films by ALD with O3 as Oxidant

KIM Seong Keun; LEE Suk Woo; HWANG Cheol Seong; MIN Yo-Sep; WON Jeong Yeon; JEONG Jaehack

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J-GLOBAL ID：200902242136278652 Reference number：06A0402526

Low Temperature (<100°C) Deposition of Aluminum Oxide Thin Films by ALD with O3 as Oxidant

O3を酸化剤として用いるALDによる酸化アルミニウム薄膜の低温(<100°C)析出

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Author (6)： , , , , ,
Material：
Volume： 153 Issue： 5 Page： F69-F76 Publication year： 2006
JST Material Number： C0285A ISSN： 1945-7111 CODEN： JESOAN Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Oxide thin films , Solid-gos interface in general. , Bases,metal oxides

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Low Temperature (<100°C) Deposition of Aluminum Oxide Thin Films by ALD with O<sub>3</sub> as Oxidant