Art

J-GLOBAL ID：200902244043237762   Reference number：06A1033656

Ratio of Transverse Diffusion Coefficient to Mobility of Electrons in High-Pressure Xenon and Xenon Doped with Hydrogen

高圧キセノン及び水素添加したキセノン中の電子移動度に対する横拡散係数の比

Author (14)： KOBAYASHI Shingo (Waseda Univ., Tokyo, JPN) ,  HASEBE Nobuyuki (Waseda Univ., Tokyo, JPN) ,  HOSOJIMA Takehiro (Waseda Univ., Tokyo, JPN) ,  ISHIZAKI Takeshi (Waseda Univ., Tokyo, JPN) ,  IWAMATSU Kazuhiro (Waseda Univ., Tokyo, JPN) ,  MIMURA Mitsuteru (Waseda Univ., Tokyo, JPN) ,  MIYACHI Takashi (Waseda Univ., Tokyo, JPN) ,  MIYAJIMA Mitsuhiro (Waseda Univ., Tokyo, JPN) ,  PUSHKIN Kirill (Waseda Univ., Tokyo, JPN) ,  TEZUKA Chikara (Waseda Univ., Tokyo, JPN) ,  DOKE Tadayoshi (Waseda Univ., Tokyo, JPN) ,  KOBAYASHI Masanori (Japan Aerospace Exploration Agency, Ibaraki, JPN) ,  SHIBAMURA Eido (Saitama Prefectural Univ., Saitama, JPN) ,  ISHIZUKA Akihiro (Japan Atomic Energy Agency, Fukui, JPN)
Material： Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers  (Japanese Journal of Applied Physics. Part 1. Regular Papers, Brief Communications & Review Papers)
Volume： 45  Issue： 10A  Page： 7894-7900  Publication year： Oct. 15, 2006 
JST Material Number： G0520B  ISSN： 0021-4922  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： xenon ,...
Semi thesaurus term： *電子移動度

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=06A1033656&from=J-GLOBAL&jstjournalNo=G0520B") }}

JST classification (1)： Radiation detection and detectors  (AD08020J)

Reference (20)：

• E. Aprile, A. Curioni, V. Egorov, K. L. Giboni, U. Oberlack, S. Ventura, T. Doke, K. Takizawa, E. L. Chupp and P. P. Dunphy: Nucl. Instrum. Methods Phys. Res., Sect. A 461(2001)256.
• T. Tanimori, H. Kubo, K. Miuchi, T. Nagayoshi, R. Orito, A. Takada, A. Takeda and M. Ueno: New Astron. Rev.48(2004)263.
• N. Hasebe, T. Doke, M. Hareyama, T. Hosojima, M. Kobayashi, S. Kobayashi, T. Miyachi, M. Miyajima, O. Okudaira, K. Pushkin, K. Sakurai, E. Shibamura, C. Tezuka and N. Yamashita: Proc.2nd Int. Workshop Applications of Rare Gas Xenon to Science And Technology (XeSAT2005), Tokyo, 2005, p. 116.
• S. Kobayashi, N. Hasebe, T. Hosojima, T. Igarashi, M.-N. Kobayashi, M. Mimura, T. Miyachi, M. Miyajima, K. N. Pushkin, H. Sakaba, C. Tezuka, T. Doke and E. Shibamura: Adv. Space Res.37(2006)28.
• T. Koizumi, E. Shirakawa and Ogawa: J. Phys. B 19(1986)2331.

Terms in the title (6)： 高圧 ,  キセノン ,  水素添加 ,  電子移動度 ,  拡散係数 ,  比