Art

J-GLOBAL ID：200902245763104545   Reference number：09A0189335

Liquid Phase Deposition of Amorphous Carbon and Carbon Nitride Films

アモルファス炭素および窒化炭素膜の液相堆積

Author (4)： KIYOTA Hideo (Dep. of Mechanical Systems Engineering, School of Industrial Engineering, Tokai Univ., JPN) ,  GAMO Hidenori (Technical Res. Inst., Toppan Printing Co., Ltd., JPN) ,  NISHITANI-GAMO Mikka (Dep. of Applied Chemistry and Sensor Photonics Res. Center, Toyo Univ., JPN) ,  ANDO Toshihiro (National Inst. for Materials Sci., JPN)
Material： e-Journal of Surface Science and Nanotechnology (Web)  (表面科学とナノテクノロジー)
Volume： 7  Page： 102-106 (J-STAGE)  Publication year： 2009 
JST Material Number： U0016A  ISSN： 1348-0391  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *carbon material ,  *liquid phase growth ,  precipitation (phase separation) ,  *carbon compound ,  *nitride ,  electrolysis ,  chemical composition ,  thin film ,  field emission ,  electron microscopy ,  X-ray photoelectron spectrum ,  *carbon nitride ,  *amorphous carbon ,  *liquid phase deposition
Semi thesaurus term： *amorphous carbon ,  *liquid phase deposition

JST classification (2)： Thin films of other inorganic compounds  (BK14060A) ,  Inorganic compounds and elements in general  (CD01010D)

Reference (18)：

• [1] Y. Namba, J. Vac. Sci. Technol. A 10, 3368 (1992).
• [2] H. Wang, M. R. Shen, Z. Y. Ning, C. Ye, C. B. Cao, H. Y. Dang, and H. S. Zhu, Appl. Phys. Lett. 69, 1074 (1996).
• [3] D. Guo, K. Cai, L. -T. Li, Y. Huang, Z. -L. Gui, and H. -S. Zhu, Carbon 39, 1395 (2001).
• [4] H. Kiyota, H. Araki, H. Kobayashi, T. Shiga, K. Kitaguchi, M. Iida, H. Wang, T. Miyo, T. Takida, T. Kurosu, K. Inoue, I. Saito, M. Nishitani-Gamo, I. Sakaguchi, and T. Ando, Appl. Phys. Lett. 75, 2331 (1999).
• [5] A. Y. Liu and M. Cohen, Science 245, 841 (1989).

Terms in the title (5)： アモルファス炭素 ,  窒化 ,  炭素膜 ,  液相 ,  堆積